DIAMINE CONTAINING IMIDO GROUP, POLYIMIDE PRECURSOR CONTAINING THE IMIDE GROUP, POSITIVE TYPE PHOTOSENSITIVE RESIN CONTAINING THE PRECURSOR, MANUFACTURING METHOD OF POSITIVE TYPE PATTERN, AND ELECTRONIC PARTS

PROBLEM TO BE SOLVED: To provide a positive type photosensitive resin composition capable of forming a polyimide film that excels in transparency, has fine pattern forming capability and combines a low dielectric constant and high heat resistance, and to provide a manufacturing method of a positive...

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Hauptverfasser:	MASAMI HIROSHI, HASEGAWA MASATOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a positive type photosensitive resin composition capable of forming a polyimide film that excels in transparency, has fine pattern forming capability and combines a low dielectric constant and high heat resistance, and to provide a manufacturing method of a positive type pattern. SOLUTION: The positive type photosensitive resin composition contains an imido group-containing polyimide precursor represented by general formula (2), an organic solvent and a diazo naphthoquinone type sensitizer. In the formula, A indicates a tetravalent alicyclic group, R2indicates a divalent alicyclic group, and R1indicates at least one divalent organic group selected from the group consisting of aromatic groups, aliphatic groups and alicyclic groups. X indicates a molar ratio of the repeating unit and is in the range of 0.05-0.95. COPYRIGHT: (C)2006,JPO&NCIPI