SUBSTRATE TREATMENT APPARATUS

PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus which can prevent or suppress the contamination of a treatment chamber even if a vacuum pump is out of order. SOLUTION: The substrate treatment apparatus is provided with a treatment chamber 201, gas supply means 232a and 232b to supply gas to the treatment chamber 201, an exhaust pipe 231 communicated with the treatment chamber 201, an opening and closing valve 243d provided in the exhaust pipe 231, a pump 246 communicated with the exhaust pipe 243d on a downstream side from the opening and closing valve 243d, and a controller 321 to control at least the opening and closing valve 243d and the pump 246. In the case that an abnormality occurs in the pump 246, the opening and closing valve 243d is closed before the pump 246 stops. COPYRIGHT: (C)2006,JPO&NCIPI