SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a semiconductor device which accelerates a CMOS transistor by raising the carrier mobility by the stress of a sidewall, and to provide a method of manufacturing the same. SOLUTION: First sidewalls 16a, 16b each having a tensile stress are formed on the side faces of...

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Bibliographische Detailangaben
1. Verfasser: FUJIMOTO HIROMASA
Format: Patent
Sprache:eng
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