SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
PROBLEM TO BE SOLVED: To provide a semiconductor device which accelerates a CMOS transistor by raising the carrier mobility by the stress of a sidewall, and to provide a method of manufacturing the same. SOLUTION: First sidewalls 16a, 16b each having a tensile stress are formed on the side faces of...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!