HEAT TREATMENT APPARATUS

PROBLEM TO BE SOLVED: To prevent the warp of a substrate caused by heating via a susceptor. SOLUTION: A susceptor 72 is provided in the chamber body of a heat treatment apparatus, abuts on the underside of the substrate 9, and supports the substrate 9. The susceptor 72 has a convex supporting surface 722 which slightly and gradually becomes higher from the periphery 723 to the central part 724. The supporting surface 722 is heated by a hot plate 71 mounted on the underside of the susceptor 72. In the heat treatment apparatus 1, as to the substrate 9 carried in the chamber body, the central part 724 of the convex supporting surface 722 abuts on the underside of the substrate 9 prior to the abutment on the periphery 723 so that the central part of the substrate 9 is heated slightly earlier than the peripheral part thereof. Thus, the warp of the substrate 9 caused by heating via the susceptor 72 can be prevented. COPYRIGHT: (C)2006,JPO&NCIPI