THIN FILM, OPTICAL ELEMENT HAVING THE SAME AND FILM-FORMING METHOD

PROBLEM TO BE SOLVED: To provide a thin film where aberrations can be reduced, coping with a wide incident angle, while fully maintaining transmission performance, and to provide an optical element in which the thin film is formed on a surface. SOLUTION: In the optical element, the thin film is form...

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Bibliographische Detailangaben
1. Verfasser:	KATO MASAKIYO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a thin film where aberrations can be reduced, coping with a wide incident angle, while fully maintaining transmission performance, and to provide an optical element in which the thin film is formed on a surface. SOLUTION: In the optical element, the thin film is formed on a reflecting face, on which incident light is reflected. In the optical element, thickness of the thin film is made smaller, as the incident angle of incident light on the reflection face becomes larger. COPYRIGHT: (C)2006,JPO&NCIPI