METHOD FOR CLEANING CHAMBER

PROBLEM TO BE SOLVED: To provide a method for cleaning a chamber wherein consumption of gas is reduced whose global warming potential (GWP) is high, cleaning effect is not damaged, and gas cost is also reduced. SOLUTION: Nitrogen trifluoride and oxygen are included in mixed gas, propene hexafluoride...

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Bibliographische Detailangaben
Hauptverfasser:	JINRIKI MANABU, ISAKI RYUICHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for cleaning a chamber wherein consumption of gas is reduced whose global warming potential (GWP) is high, cleaning effect is not damaged, and gas cost is also reduced. SOLUTION: Nitrogen trifluoride and oxygen are included in mixed gas, propene hexafluoride, amount of the propene hexafluoride with respect to amount of the nitrogen trifluoride is made settled as 0.25-2 to 1 of nitrogen trifluoride, and amount of the oxygen with respect to amount of the propene hexafluoride is made settled as 3-6 to 1 of propene hexafluoride. The mixed gas is introduced in a chamber 11 and made plasma in the chamber 11. COPYRIGHT: (C)2006,JPO&NCIPI