EXPOSURE DEVICE AND MANUFACTURING METHOD OF MICRO DEVICE

PROBLEM TO BE SOLVED: To provide an exposure device which can prevent vibration caused by the reaction force of a linear motor stator aiming at miniaturization of the device and reduction in a manufacturing cost. SOLUTION: The exposure device for exposing the pattern formed in a mask M on a photosen...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	KAWAMURA HIDEJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an exposure device which can prevent vibration caused by the reaction force of a linear motor stator aiming at miniaturization of the device and reduction in a manufacturing cost. SOLUTION: The exposure device for exposing the pattern formed in a mask M on a photosensitive board P is provided with a chamber 2 for accommodating the main part of the exposure device; stages MST and PST wherein it is accommodated in the chamber and the mask or the photosensitive substrate is laid; a linear motor for driving the above stages; and drive reaction force socket section materials 12a, 12b, 40a and 40b which connect linear motor stators 10a and 38a provided by the linear motor to the chamber. The chamber responds to the reaction force of the linear motor stator generated when the stage is driven by the linear motor via the drive reaction force receiving material. COPYRIGHT: (C)2006,JPO&NCIPI