DEFECT CLASSIFICATION METHOD AND DEVICE OF MASK

PROBLEM TO BE SOLVED: To provide a pattern defect classification method and a pattern defect classification device for classifying and quantitating a pattern defect highly accurately at high speed. SOLUTION: This method for determining and classifying the kind of a mask defect is described as follow...

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Bibliographische Detailangaben
Hauptverfasser: YONEKURA ISAO, SUSA TAKASHI, NOHAMA SHIYOUJI, TAMURA AKIRA, ITOU KOUJIROU, NAKANO HIROYUKI, IWASE KAZUYA, KUNIYA SHINJI, MORIYA SHIGERU, KITAGAWA TETSUYA
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a pattern defect classification method and a pattern defect classification device for classifying and quantitating a pattern defect highly accurately at high speed. SOLUTION: This method for determining and classifying the kind of a mask defect is described as follows: an image of design data used for manufacture of the mask (1) and an image of an inspection object mask are acquired; the pattern position of the inspection object mask and an inspection range are set (23); the area ratio of the mask image to the design data image is calculated in the inspection range (24); the pattern circularity of the image of the inspection object mask is calculated (27); and each coordinate of the center of gravity of each pattern of the image of the design data and the image of the inspection object mask is calculated respectively (33). This defect classification device for executing the method is also provided. COPYRIGHT: (C)2006,JPO&NCIPI