PLASMA TREATMENT APPARATUS

PROBLEM TO BE SOLVED: To enhance the utilization efficiency of active species and to carry out a high-speed plasma treatment, without troubles when carrying out a plasma treatment to a comparatively large substrate, in an atmospheric pressure plasma treatment apparatus. SOLUTION: A plasma treatment...

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Bibliographische Detailangaben
Hauptverfasser: NISHIKAWA KAZUHIRO, YOSHIMOTO SHOZO, TAKAHASHI DAISUKE
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To enhance the utilization efficiency of active species and to carry out a high-speed plasma treatment, without troubles when carrying out a plasma treatment to a comparatively large substrate, in an atmospheric pressure plasma treatment apparatus. SOLUTION: A plasma treatment apparatus is provided with a discharge inhibition 6 having an exposed surface 6a to a plasma generation space 13 for generating a plasma near atmospheric pressure, and electric field generating means for generating the plasma near the exposed surface 6a out of the plasma generation space 13 by generating an electric field through the electric discharge inhibiting section 6. The electric discharge inhibiting 6 is provided with a gas stream path 7 for supplying a desired gas to the plasma generating space 13. With respect to a cross-sectional shape of the gas stream path 7, the dimension in the electric field direction formed by the electric field generating means is sufficiently small to be able to suppress a plasma generation in the gas stream path 7, even if an electric field is formed. COPYRIGHT: (C)2006,JPO&NCIPI