ELLIPTIC POLARIMETER, MEASURING DEVICE AND METHOD, AND LITHOGRAPHY DEVICE AND METHOD

PROBLEM TO BE SOLVED: To provide an elliptic polarimeter, a measuring device and a method, a lithography device and a method. SOLUTION: The elliptic polarimeter has an optical component and a detector. The optical component has two double-refractive parts which carry out optical communication via a...

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1. Verfasser:	PRESURA CRISTIAN N
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY COLORIMETRY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RADIATION PYROMETRY SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an elliptic polarimeter, a measuring device and a method, a lithography device and a method. SOLUTION: The elliptic polarimeter has an optical component and a detector. The optical component has two double-refractive parts which carry out optical communication via a boundary surface. The light incident on the boundary surface is divided into two reflecting components and two transmitted components. The detector is performed so as to measure the characteristics of at least three components in these four components. The polarizing state of the incident light can be determined, based on the measured characteristics. COPYRIGHT: (C)2006,JPO&NCIPI