METHOD OF CLEANING CHAMBER

PROBLEM TO BE SOLVED: To provide a method of cleaning a chamber capable of cleaning the inside of the chamber efficiently in a short time by optimizing the kinds and the mixing ratio of gas which are mixed to hexafluoride propene and also by finding out the optimum conditions in cleaning treatment....

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Bibliographische Detailangaben
Hauptverfasser:	JINRIKI MANABU, ISAKI RYUICHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method of cleaning a chamber capable of cleaning the inside of the chamber efficiently in a short time by optimizing the kinds and the mixing ratio of gas which are mixed to hexafluoride propene and also by finding out the optimum conditions in cleaning treatment. SOLUTION: Mixed gas of oxygen containing hexafluoride propene of 15-25% is introduced into the chamber so that it may be made to plasma within the chamber. Then, the mixed gas pressure in the chamber is set as 530-933Pa so as to perform a high-pressure cleaning process. COPYRIGHT: (C)2006,JPO&NCIPI