ACTIVE MATRIX TYPE SUBSTRATE AND MANUFACTURING METHOD FOR THE SAME

PROBLEM TO BE SOLVED: To provide an active matrix type substrate which suppresses hydration due to moisture in anisotropic conductive resin for mounting a drive IC of a drawing line of a liquid crystal display panel. SOLUTION: The drawing lines 2A and 2B are connected to a scanning line (gate line 1...

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Bibliographische Detailangaben
Hauptverfasser: TANI MASATOSHI, MOTOJIMA HIDETO, SONOHATA MASAKAZU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an active matrix type substrate which suppresses hydration due to moisture in anisotropic conductive resin for mounting a drive IC of a drawing line of a liquid crystal display panel. SOLUTION: The drawing lines 2A and 2B are connected to a scanning line (gate line 17) of a TFT30 and a signal line (drain line 15) and are conducted to one edge of a transparent insulator substrate. In top sections of the drawing lines, conductive terminals 20A and 20B united with the drawing lines are formed and a plurality of contact holes 10C and 10D which are connected to the conductive terminals, are formed on the terminals. On the drawing lines in the neighborhood of the contact holes, a pattern 12 of a semiconductor film which shuts off ongoing to the drawing line surface of residual moisture in the anisotropic conductive resin via a first inter-layer insulator film is formed. COPYRIGHT: (C)2006,JPO&NCIPI