PHOTOSENSITIVE FILM, SCREEN PRINTING PLATE, AND PHOTOSENSITIVE FILM FOR ETCHING

PROBLEM TO BE SOLVED: To provide a photosensitive transparent film capable of being developed by neutral water after being irradiated with light by enabling film application without using an organic solvent. SOLUTION: In the photosensitive transparent film, a photosenstive resin composition dissolvi...

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Bibliographische Detailangaben
Hauptverfasser:	KAWANOBU JUNICHI, IWATA SHUJI, HOTTA TOMOKO, ICHIMURA KUNIHIRO, ADACHI DAISAKU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photosensitive transparent film capable of being developed by neutral water after being irradiated with light by enabling film application without using an organic solvent. SOLUTION: In the photosensitive transparent film, a photosenstive resin composition dissolving or diffusing 12-200 pts.wt of a photo acid initiator generating a Broensted acid or Lewis acid by action of an active energy beam and 10-2000 pts.wt of an epoxy compound having at least one epoxy group in water solution of 100 pts.wt of polyvinyl alcohol in a saponification rate of 60 % or more is laminated on a support film. COPYRIGHT: (C)2006,JPO&NCIPI