FILM THICKNESS MEASUREMENT METHOD FOR SURFACE LAYER OXIDE FILM OF ZINC BASE PLATED SHEET IRON

PROBLEM TO BE SOLVED: To provide a technique for measuring quickly and highly precisely the thickness of the oxide film of 10-100 nm thick formed on the zinc base plated sheet iron, and to evaluates the press formability of the plated sheet iron from the measured thickness of the oxide film. SOLUTIO...

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Bibliographische Detailangaben
Hauptverfasser:	SATO SHIGEOMI, NAGOSHI MASAYASU, SUGIMOTO YOSHIHARU, NORO HISATO, TAIRA SHOICHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a technique for measuring quickly and highly precisely the thickness of the oxide film of 10-100 nm thick formed on the zinc base plated sheet iron, and to evaluates the press formability of the plated sheet iron from the measured thickness of the oxide film. SOLUTION: A film thickness measurement method for the oxide film formed on the surface layer of the zinc base plated steel iron for eliminating the effect of the secondary ray of the L ray of the zinc, is as follows: the surface of the zinc base plated steel iron is irradiated with the electron beam accelerated to 3-6 kV by using the scanning type electron microscope provided with electron beam micro-analyzer or wavelength dispersive X-ray detector, the intensity of Kα ray of the oxygen generated thereby is measured by a detector and its subsequent pulse height analyzer. COPYRIGHT: (C)2006,JPO&NCIPI