STORAGE CONTAINER AND STORAGE METHOD FOR SEMICONDUCTOR SUBSTRATE

PROBLEM TO BE SOLVED: To provide a storage container and a storage method for a semiconductor substrate which can prevent the raising of particles attached to the inner wall of the container by the introduction of an inert gas, and can improve replacement efficiency into the inert gas. SOLUTION: The...

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1. Verfasser: YAMAZAKI TAKAHIDE
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a storage container and a storage method for a semiconductor substrate which can prevent the raising of particles attached to the inner wall of the container by the introduction of an inert gas, and can improve replacement efficiency into the inert gas. SOLUTION: The semiconductor substrate storage device stores a semiconductor substrate storage cassette 100 wherein a plurality of semiconductor substrates 101 are stored in stages in a sealed container 102. The sealed container 102 is equipped with a gas supply valve 103 for supplying and stopping a clean inert gas, a gas nozzle 104 composed of a porous metal oxide wherein pores of 0.1-500 μm in diameter are formed in order, a vacuum exhaust valve 105 for evacuation, a check valve 106, and a gas flow controller 107 installed in a gas supply line. The gas nozzle 104 is installed in the upper part of one side wall of the sealed container 102, while the vacuum exhaust valve 105 and the check valve 106 are installed in the lower part of the other side face opposite from the one where the gas nozzle 104 is installed. COPYRIGHT: (C)2006,JPO&NCIPI