EVALUATION METHOD AND ADJUSTING METHOD OF LIGHT INTENSITY DISTRIBUTION, LIGHTING OPTICAL DEVICE, EXPOSURE DEVICE AND EXPOSURE METHOD
PROBLEM TO BE SOLVED: To provide an evaluation method for quantitatively and high precision evaluating the symmetry uniformity of light intensity distribution formed on a lighting pupil face of a lighting optical device, for example. SOLUTION: The method includes a setting process (S2) for setting a...
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creator | NISHINAGA HISASHI |
description | PROBLEM TO BE SOLVED: To provide an evaluation method for quantitatively and high precision evaluating the symmetry uniformity of light intensity distribution formed on a lighting pupil face of a lighting optical device, for example. SOLUTION: The method includes a setting process (S2) for setting a first division region and a second division region, which are almost symmetrical on a division line, passing a center point of light intensity distribution in the region of light intensity distribution; a calculating process (S3) for calculating a first light intensity calculation value, obtained by integrating light intensity distribution in the first division region for the first division region; and a second light intensity calculation value obtained by integrating light intensity distribution in the second division region for the second division region; and a deciding process (S4) judging symmetrical uniformity on the division line of light intensity distribution, based on the first light intensity calculated value and the second light intensity calculation value. COPYRIGHT: (C)2006,JPO&NCIPI |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2005322855A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2005322855A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2005322855A3</originalsourceid><addsrcrecordid>eNrjZGhxDXP0CXUM8fT3U_B1DfHwd1Fw9ANiF6_Q4BBPP3eYoL-bgo-nu0eIgqdfiKtfsGdIpIKLZ3BIkKdTKEivDkQWpME_IMTT2dFHwcU1zNPZVUfBNSLAPzg0yBUqADYeLgYxnYeBNS0xpziVF0pzMyi5uYY4e-imFuTHpxYXJCan5qWWxHsFGBkYmBobGVmYmjoaE6UIAP6VPe0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>EVALUATION METHOD AND ADJUSTING METHOD OF LIGHT INTENSITY DISTRIBUTION, LIGHTING OPTICAL DEVICE, EXPOSURE DEVICE AND EXPOSURE METHOD</title><source>esp@cenet</source><creator>NISHINAGA HISASHI</creator><creatorcontrib>NISHINAGA HISASHI</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide an evaluation method for quantitatively and high precision evaluating the symmetry uniformity of light intensity distribution formed on a lighting pupil face of a lighting optical device, for example. SOLUTION: The method includes a setting process (S2) for setting a first division region and a second division region, which are almost symmetrical on a division line, passing a center point of light intensity distribution in the region of light intensity distribution; a calculating process (S3) for calculating a first light intensity calculation value, obtained by integrating light intensity distribution in the first division region for the first division region; and a second light intensity calculation value obtained by integrating light intensity distribution in the second division region for the second division region; and a deciding process (S4) judging symmetrical uniformity on the division line of light intensity distribution, based on the first light intensity calculated value and the second light intensity calculation value. COPYRIGHT: (C)2006,JPO&NCIPI</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; COLORIMETRY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT ; MEASURING ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; RADIATION PYROMETRY ; SEMICONDUCTOR DEVICES ; TESTING</subject><creationdate>2005</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20051117&DB=EPODOC&CC=JP&NR=2005322855A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20051117&DB=EPODOC&CC=JP&NR=2005322855A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NISHINAGA HISASHI</creatorcontrib><title>EVALUATION METHOD AND ADJUSTING METHOD OF LIGHT INTENSITY DISTRIBUTION, LIGHTING OPTICAL DEVICE, EXPOSURE DEVICE AND EXPOSURE METHOD</title><description>PROBLEM TO BE SOLVED: To provide an evaluation method for quantitatively and high precision evaluating the symmetry uniformity of light intensity distribution formed on a lighting pupil face of a lighting optical device, for example. SOLUTION: The method includes a setting process (S2) for setting a first division region and a second division region, which are almost symmetrical on a division line, passing a center point of light intensity distribution in the region of light intensity distribution; a calculating process (S3) for calculating a first light intensity calculation value, obtained by integrating light intensity distribution in the first division region for the first division region; and a second light intensity calculation value obtained by integrating light intensity distribution in the second division region for the second division region; and a deciding process (S4) judging symmetrical uniformity on the division line of light intensity distribution, based on the first light intensity calculated value and the second light intensity calculation value. COPYRIGHT: (C)2006,JPO&NCIPI</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>COLORIMETRY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT</subject><subject>MEASURING</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>RADIATION PYROMETRY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2005</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZGhxDXP0CXUM8fT3U_B1DfHwd1Fw9ANiF6_Q4BBPP3eYoL-bgo-nu0eIgqdfiKtfsGdIpIKLZ3BIkKdTKEivDkQWpME_IMTT2dFHwcU1zNPZVUfBNSLAPzg0yBUqADYeLgYxnYeBNS0xpziVF0pzMyi5uYY4e-imFuTHpxYXJCan5qWWxHsFGBkYmBobGVmYmjoaE6UIAP6VPe0</recordid><startdate>20051117</startdate><enddate>20051117</enddate><creator>NISHINAGA HISASHI</creator><scope>EVB</scope></search><sort><creationdate>20051117</creationdate><title>EVALUATION METHOD AND ADJUSTING METHOD OF LIGHT INTENSITY DISTRIBUTION, LIGHTING OPTICAL DEVICE, EXPOSURE DEVICE AND EXPOSURE METHOD</title><author>NISHINAGA HISASHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2005322855A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2005</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>COLORIMETRY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT</topic><topic>MEASURING</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>RADIATION PYROMETRY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>NISHINAGA HISASHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NISHINAGA HISASHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EVALUATION METHOD AND ADJUSTING METHOD OF LIGHT INTENSITY DISTRIBUTION, LIGHTING OPTICAL DEVICE, EXPOSURE DEVICE AND EXPOSURE METHOD</title><date>2005-11-17</date><risdate>2005</risdate><abstract>PROBLEM TO BE SOLVED: To provide an evaluation method for quantitatively and high precision evaluating the symmetry uniformity of light intensity distribution formed on a lighting pupil face of a lighting optical device, for example. SOLUTION: The method includes a setting process (S2) for setting a first division region and a second division region, which are almost symmetrical on a division line, passing a center point of light intensity distribution in the region of light intensity distribution; a calculating process (S3) for calculating a first light intensity calculation value, obtained by integrating light intensity distribution in the first division region for the first division region; and a second light intensity calculation value obtained by integrating light intensity distribution in the second division region for the second division region; and a deciding process (S4) judging symmetrical uniformity on the division line of light intensity distribution, based on the first light intensity calculated value and the second light intensity calculation value. COPYRIGHT: (C)2006,JPO&NCIPI</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY COLORIMETRY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RADIATION PYROMETRY SEMICONDUCTOR DEVICES TESTING |
title | EVALUATION METHOD AND ADJUSTING METHOD OF LIGHT INTENSITY DISTRIBUTION, LIGHTING OPTICAL DEVICE, EXPOSURE DEVICE AND EXPOSURE METHOD |
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