EVALUATION METHOD AND ADJUSTING METHOD OF LIGHT INTENSITY DISTRIBUTION, LIGHTING OPTICAL DEVICE, EXPOSURE DEVICE AND EXPOSURE METHOD

PROBLEM TO BE SOLVED: To provide an evaluation method for quantitatively and high precision evaluating the symmetry uniformity of light intensity distribution formed on a lighting pupil face of a lighting optical device, for example. SOLUTION: The method includes a setting process (S2) for setting a...

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1. Verfasser: NISHINAGA HISASHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an evaluation method for quantitatively and high precision evaluating the symmetry uniformity of light intensity distribution formed on a lighting pupil face of a lighting optical device, for example. SOLUTION: The method includes a setting process (S2) for setting a first division region and a second division region, which are almost symmetrical on a division line, passing a center point of light intensity distribution in the region of light intensity distribution; a calculating process (S3) for calculating a first light intensity calculation value, obtained by integrating light intensity distribution in the first division region for the first division region; and a second light intensity calculation value obtained by integrating light intensity distribution in the second division region for the second division region; and a deciding process (S4) judging symmetrical uniformity on the division line of light intensity distribution, based on the first light intensity calculated value and the second light intensity calculation value. COPYRIGHT: (C)2006,JPO&NCIPI