LAMINATE FOR FORMING WIRING SUBSTRATE, WIRING SUBSTRATE ANS ITS FORMING METHOD

PROBLEM TO BE SOLVED: To provide a laminate for a wiring substrate in which adhesiveness is made superior, electric resistance is made low, an etching speed is fast and etching performance and productivity are made superior, to provide a method to form the wiring substrate by etching the laminate an...

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1. Verfasser: HIRUMA TAKEHIKO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a laminate for a wiring substrate in which adhesiveness is made superior, electric resistance is made low, an etching speed is fast and etching performance and productivity are made superior, to provide a method to form the wiring substrate by etching the laminate and to provide the wiring substrate. SOLUTION: The laminate for forming the wiring substrate is provided with a substrate layer which is formed on a substrate and is made of Mo as a major ingredient and does not include oxygen and/or nitrogen and a conductor layer which is made of Mo as the major ingredient and does not include oxygen and nitrogen. It is desirable to set a total amount of inclusion of oxygen and nitrogen in the substrate layer to be 5 to 50 atom%. COPYRIGHT: (C)2006,JPO&NCIPI