SYSTEM AND METHOD FOR VERIFYING AND CONTROLLING PERFORMANCE OF MASKLESS LITHOGRAPHY TOOL

PROBLEM TO BE SOLVED: To provide a maskless lithography system and a method that eliminate the defects of conventional techniques. SOLUTION: There are provided the maskless lithography system that includes a spatial light modulator, including a plurality of spatial light modulator cells; a reference...

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1. Verfasser:	MASON CHRISTOPHER J
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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creator	MASON CHRISTOPHER J
description	PROBLEM TO BE SOLVED: To provide a maskless lithography system and a method that eliminate the defects of conventional techniques. SOLUTION: There are provided the maskless lithography system that includes a spatial light modulator, including a plurality of spatial light modulator cells; a reference reticle having at least one reference feature; a pattern stabilizer which applies a signal to the spatial light modulator to form a die pattern, including at least the one reference feature, an illumination source, which emits illumination energy to illuminate the spatial light modulator and reference reticle; and a projection optical system having a pupil, and forms a die image with illumination energy incident on the pupil from the spatial light modulator, and a reference image with illumination energy incident on the pupil from the reference reticle. A method of adjusting the maskless lithography system which corresponds thereto is also provided. COPYRIGHT: (C)2006,JPO&NCIPI
format	Patent
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subjects	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
title	SYSTEM AND METHOD FOR VERIFYING AND CONTROLLING PERFORMANCE OF MASKLESS LITHOGRAPHY TOOL
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