SYSTEM AND METHOD FOR VERIFYING AND CONTROLLING PERFORMANCE OF MASKLESS LITHOGRAPHY TOOL

PROBLEM TO BE SOLVED: To provide a maskless lithography system and a method that eliminate the defects of conventional techniques. SOLUTION: There are provided the maskless lithography system that includes a spatial light modulator, including a plurality of spatial light modulator cells; a reference reticle having at least one reference feature; a pattern stabilizer which applies a signal to the spatial light modulator to form a die pattern, including at least the one reference feature, an illumination source, which emits illumination energy to illuminate the spatial light modulator and reference reticle; and a projection optical system having a pupil, and forms a die image with illumination energy incident on the pupil from the spatial light modulator, and a reference image with illumination energy incident on the pupil from the reference reticle. A method of adjusting the maskless lithography system which corresponds thereto is also provided. COPYRIGHT: (C)2006,JPO&NCIPI