EXPOSURE METHOD OF MASKLESS EXPOSURE APPARATUS, AND MASKLESS EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To provide an exposure method of a maskless exposure apparatus and the maskless exposure apparatus, by which the relative positions of a camera and a spatial light modulator or a plurality of spatial light modulators can be easily obtained with high accuracy and the process acc...

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Bibliographische Detailangaben
1. Verfasser:	OSAKA YOSHIHISA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an exposure method of a maskless exposure apparatus and the maskless exposure apparatus, by which the relative positions of a camera and a spatial light modulator or a plurality of spatial light modulators can be easily obtained with high accuracy and the process accuracy can be improved. SOLUTION: A material which changes color by exposure, for example, a photochromic sensitive material is applied on the surface of the exposure object (work) 9. The exposure object 9 is exposed, by using the spatial light modulator 3 having a plurality of mirrors, the coordinate of the exposure position is read by a camera 5, disposed in the spatial modulator 3 side to obtain the positions of the camera 5 and the spatial light modulator 3, and the object is exposed based on that result. COPYRIGHT: (C)2006,JPO&NCIPI