PRECURSOR COMPOUND FOR DEPOSITING COATING FILM OF CERAMIC AND METAL, AND METHOD FOR PREPARING THE SAME

PROBLEM TO BE SOLVED: To provide a precursor compound for depositing the coating film of a ceramic and a metal, and to provide a method for preparing the same. SOLUTION: The precursor compound for depositing the coating film of the ceramic and the metal is used for the coating film of the ceramic or...

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Bibliographische Detailangaben
1. Verfasser:	SHIN HYUN KOOCK
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY ORGANIC CHEMISTRY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a precursor compound for depositing the coating film of a ceramic and a metal, and to provide a method for preparing the same. SOLUTION: The precursor compound for depositing the coating film of the ceramic and the metal is used for the coating film of the ceramic or the metal on a silicon substrate, for example, for depositing a metal nitride, a metal oxide, a metal silicate, a mixed metal nitride, an oxide and a silicate, and a pure metal. A metal for preparing the same, and a method for forming a coating film on the substrate with the compound. COPYRIGHT: (C)2006,JPO&NCIPI