CHARGED PARTICLE BEAM APPARATUS

PROBLEM TO BE SOLVED: To irradiate a charged particle beam to a predetermined position on an article to be irradiated with high accuracy. SOLUTION: There are provided a stage 3 for placing a material to be drawn, a laser length-measuring system for measuring the amount of movement of the stage 3, an...

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Bibliographische Detailangaben
1. Verfasser:	WAKIMOTO OSAMU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To irradiate a charged particle beam to a predetermined position on an article to be irradiated with high accuracy. SOLUTION: There are provided a stage 3 for placing a material to be drawn, a laser length-measuring system for measuring the amount of movement of the stage 3, and length-measuring means for calculating the difference of the amount of movement of the stage 3, measured by the laser length-measuring system and the amount of movement of the stage 3 as the purpose. A signal, corresponding to the amount calculated by the length-measuring means, is supplied to a beam deflecting system, and simultaneously the amount of movement of the stage occurring during the actuation of the beam-deflecting system, on the basis of a signal corresponding to a difference from the calculation of the difference is calculated, and a signal corresponding to the amount of the calculation is also supplied to the deflecting system. COPYRIGHT: (C)2006,JPO&NCIPI