SUBSTRATE TREATING DEVICE

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus that can prevent the adhesion of the mist of a processing liquid or dust generating materials to the surface of a substrate subjected to liquid drain off processing, and can reduce the turbulence of an air current by reducing the flow rate of clean air. SOLUTION: The substrate processing apparatus is provided with a processing chamber 10, a roller conveyor 18 which transports a substrate W in a horizontal direction, air knives 36a and 36b which remove the processing liquid from the main surface of the substrate W by blowing away the processing liquid by blowing an gas upon the main surface. The device is also provided with a dividing member 38 which divides the space above a substrate transporting path 20 into an upstream-side space A and a downstream-side space B with respect to the air knives 36a and 36b, an air supplying mechanism 42 which causes clean air to flow down through the downstream-side space B by supplying the air into the space B, and a means which evacuates the processing chamber 10 through the discharge port 16 of the chamber 10. A vertical dividing member 44 having openings is provided immediately under the substrate transporting path 20 on the downstream-side space B side so as to divide the space B and its downside space from each other. COPYRIGHT: (C)2005,JPO&NCIPI