TRANSFER APPARATUS

PROBLEM TO BE SOLVED: To provide a transfer apparatus which attains high accuracy patterning and allows an apparatus cost to be reduced. SOLUTION: The transfer apparatus writes a pattern with a beam on a resist on a substrate. It comprises a lens barrel for emitting a collimated beam to polarize and...

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Bibliographische Detailangaben
1. Verfasser:	SHIMAZU NOBUO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a transfer apparatus which attains high accuracy patterning and allows an apparatus cost to be reduced. SOLUTION: The transfer apparatus writes a pattern with a beam on a resist on a substrate. It comprises a lens barrel for emitting a collimated beam to polarize and scan, a mask stage 76 disposed on the path of the beam, a wafer stage 62 disposed near the mask stage for holding a substrate having a beam-sensitive resist layer on the surface, a means for changing the relative position of the mask stage to the wafer stage in the horizontal direction, and a means for fixing the relative position of the mask stage to the wafer stage in the horizontal direction. For writing a pattern, the relative position fixing means fixes the relative position of the mask stage to the wafer stage in the horizontal direction. COPYRIGHT: (C)2005,JPO&NCIPI