MICROSCOPE APPARATUS, METHOD FOR PROCESSING MICROSCOPE IMAGES, AND METHOD FOR INSPECTING SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide an electron microscope capable of creating secondary electrons and transparent electron images that are not affected by the structure in the interior of thin film samples. SOLUTION: An electron microscope apparatus includes an ammeter 14 for detecting the variations...

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1. Verfasser: ETO RYUJI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an electron microscope capable of creating secondary electrons and transparent electron images that are not affected by the structure in the interior of thin film samples. SOLUTION: An electron microscope apparatus includes an ammeter 14 for detecting the variations of feeble electric currents that flow between a sample holder to which an observation sample is attached and a wiring grounded to the earth, when an electron beam is irradiated onto a thin piece sample; and a signal processing device 11 capable of mixing up the signals obtained from the ammeter and the signals obtained from a secondary electron detector 9, or a transparent electron detector 10 or the like in a fixed proportion. The signals corrected by the signal processing device 11 and the signals of a deflecting signal control unit are synchronized and delivered to a display device. COPYRIGHT: (C)2005,JPO&NCIPI