ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD

PROBLEM TO BE SOLVED: To provide an illumination optical apparatus in which illuminance of light illuminating an objective face to be irradiated can be easily increased without replacing discharge light sources. SOLUTION: The illumination optical apparatus is equipped with a first light source 4 hav...

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Bibliographische Detailangaben
Hauptverfasser:	TAKENAKA SHUJI, KOYAMA MOTOO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an illumination optical apparatus in which illuminance of light illuminating an objective face to be irradiated can be easily increased without replacing discharge light sources. SOLUTION: The illumination optical apparatus is equipped with a first light source 4 having a discharge light source, a concave mirror 2 condensing the light from the first light source 4, and a second light source 10 having a laser light source. The objective surface M1 is illuminated with the light from the first light source 4 condensed by the concave mirror 2 and with the light from the second light source 10. COPYRIGHT: (C)2005,JPO&NCIPI