METHOD FOR FORMING THIN FILM OF TITANIUM-CONTAINING COMPOUND
PROBLEM TO BE SOLVED: To provide a method for forming a thin film of a titanium-containing compound, in which a titanium compound is used without necessitating an organic solvent when a solution of a titanium source used for coating is prepared. SOLUTION: In the method for forming the thin film of t...
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Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a method for forming a thin film of a titanium-containing compound, in which a titanium compound is used without necessitating an organic solvent when a solution of a titanium source used for coating is prepared. SOLUTION: In the method for forming the thin film of the titanium-containing compound, a base material is coated with an aqueous solution of a water-soluble titanium compound, and subjected to drying processing, and then firing processing. When the titanium-containing compound used for forming the thin film is a multiple oxide, one or more kinds selected from metal compounds of barium, strontium and bismuth is added to the aqueous solution of the water-soluble titanium compound so as to prepare a coating solution, then the coating solution is applied onto a base material, and after drying, firing treatment is performed. COPYRIGHT: (C)2005,JPO&NCIPI |
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