METHOD OF DEPOSITING ZNS FILM

PROBLEM TO BE SOLVED: To solve the problem that, when a transparent ZnS film for a hologram is deposited on the surface of a substrate to be treated, sometimes change in the color tone of the ZnS film can not be detected by the measurement of light transmittance only with an optional specified wavel...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	YOKOI SHIN, NAKATSUKA ATSUSHI, TADA ISAO, HIBINO NAOKI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY CINEMATOGRAPHY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTROGRAPHY HOLOGRAPHIC PROCESSES OR APPARATUS HOLOGRAPHY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PHOTOGRAPHY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To solve the problem that, when a transparent ZnS film for a hologram is deposited on the surface of a substrate to be treated, sometimes change in the color tone of the ZnS film can not be detected by the measurement of light transmittance only with an optional specified wavelength. SOLUTION: During deposition of a ZnS film, at least either the light transmittance or light reflectance of the ZnS film is measured, with a first wavelength selected from the wavelength range of 330 to 400 nm and a second specified wavelength selected from the wavelength range of 400 to 800 nm. Then, while change in the color tone of the ZnS film is identified from the light transmittance or light reflectance at the second specified wavelength, the film deposition rate is controlled so that the light transmittance or light reflectance at the first specified wavelength is held within the prescribed range. COPYRIGHT: (C)2005,JPO&NCIPI