TREATMENT METHOD OF SEMICONDUCTOR

PROBLEM TO BE SOLVED: To provide a treatment easy-to-use method of a semiconductor by reducing a waiting time required for treatment. SOLUTION: The treatment method of the semiconductor comprises steps for performing treatment successively to a plurality of wafers which are objects of treatment in a treatment chamber, and adjusting the treatment in the treatment chamber based on the result of detecting a state in the treatment chamber in each treatment. The method comprises a step of collecting the information of the treatment generated by the treatment, including outputs from the sensors 13, 14, to a data collection unit 2 with a storage device, a step of extracting the information of the treatment collected in the data collection unit according to a given extracting condition, a step of creating a copy of the extracted information in the other storage device 4a, and a step of analyzing the copy data created by the data copy unit and determining the state of the treatment, while the data analysis means 3 performs the treatment to the wafer in the treatment chamber. COPYRIGHT: (C)2005,JPO&NCIPI