FLUID SUPPLY MONITORING DEVICE AND SUBSTRATE PROCESSING APPARATUS
PROBLEM TO BE SOLVED: To provide a fluid supply monitoring device capable of monitoring fluid supply conditions concerning a plurality of pipes, and dealing easily with a change in the number of pipes to be monitored, by a simple and low-cost composition. SOLUTION: This fluid supply supervising devi...
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Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a fluid supply monitoring device capable of monitoring fluid supply conditions concerning a plurality of pipes, and dealing easily with a change in the number of pipes to be monitored, by a simple and low-cost composition. SOLUTION: This fluid supply supervising device 21 is provided in a substrate processing apparatus 1, and includes area type flow meters 23a-23d interposed into the middle of pipes 9a-9d for supplying fluids being supervising objects; an imaging camera 25 for imaging pictures of the flow meters 23a-23d; and a monitoring portion 27 for monitoring the supply conditions of the fluids on the basis of the imaged pictures by the imaging camera 25. By the monitoring portion 27, a picture imaged by the imaging camera 25 at each monitor timing set beforehand and a memorized picture registered beforehand and corresponding to that point of time are compared, whether or not the height position of a float picture of each flow meter 23a-23d in the imaged picture is within a predetermined permissible range, with respect to a reference position of the float picture in the corresponding memorized picture is determined, and it is determined whether or not there are any abnormalities in the supply conditions (flow rate, etc.) of each fluid. COPYRIGHT: (C)2005,JPO&NCIPI |
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