EXPOSURE APPARATUS AND METHOD

PROBLEM TO BE SOLVED: To provide an exposure apparatus and an exposure method which can perform very precise alignment of a first and a second mask and a work. SOLUTION: The exposure method comprises a fixing process of fixing an alignment stage 53 which supports a first mask holder 51 holding the first mask 41 and a second mask holder 52 holding the second mask 42 by positioning it using a positioning pin 62, etc., a first alignment process of aligning the first mask 41 and the second mask 42 by moving the second mask holder 52 with respect to the alignment stage 53, a second alignment process of aligning the second mask 42 and the work W by moving the alignment stage 53 with respect to a base 54, and an exposure process of transferring patterns onto both faces of the work W via the first mask 41 and the second mask 42. COPYRIGHT: (C)2005,JPO&NCIPI