ELECTRON SOURCE, ELECTRON BEAM INSPECTION DEVICE AND INSPECTION METHOD FOR SEMICONDUCTOR SUBSTRATE

PROBLEM TO BE SOLVED: To provide an electron source for inducing electrons so that they have rectilinear progressing properties, an electron beam inspection device for accurately irradiating electron beams inside holes arranged at fine intervals while having fine diameters, and an inspection method for inspecting defective opening of the holes formed on a semiconductor substrate for the whole of the substrate. SOLUTION: A defective opening inspection device for holes 100 includes an anode electrode 110 to which a semiconductor substrate W with a plurality of holes formed thereon are positioned. A cathode electrode 120 to emit the electrons is disposed above the anode electrode 110. A bundle type nanotube 140 for converting the electrons emitted from the cathode electrode 120 into the electron beams arranged at the fine intervals to have the rectilinear progressing properties is disposed below the cathode electrode 120 facing the front face of the substrate W. An ammeter 150 measures a current leaked though the back face of the substrate W. COPYRIGHT: (C)2005,JPO&NCIPI