LITHOGRAPHY APPARATUS AND METHOD FOR MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To provide a lithography apparatus having an illumination system for supplying projection beams of radiation. SOLUTION: The apparatus has a support structure MT for supporting patterning means, a substrate table WT for supporting a substrate, and a projection system PL for proj...

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Hauptverfasser:	LIEBREGTS PAULUS MARTINUS MARIA, BARTRAY PERTRUS R, VAN ENGELEN ANGELO A M, AMHAOUCH MUSTAFA, MEESTERS TIM ANTON JOHAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a lithography apparatus having an illumination system for supplying projection beams of radiation. SOLUTION: The apparatus has a support structure MT for supporting patterning means, a substrate table WT for supporting a substrate, and a projection system PL for projecting a patterned beam onto a target area of the substrate. Moreover, the apparatus has at least an illumination system IL and a vacuum system 100 in which the substrate table is located, and the vacuum system 100 has vacuum modules 101 to 107. A first vacuum modules 102, 107 have at least the projection system and/or illumination system IL, and a second vacuum module 1021 has the vacuum table WT. At least two of the vacuum modules 101 to 107 are connected to each other through closable connection parts 120 to 128 and 130. COPYRIGHT: (C)2005,JPO&NCIPI