MASK HOLDING MECHANISM

PROBLEM TO BE SOLVED: To provide a mask holding mechanism wherein an error of position precision between a position precision measuring apparatus of a mask and a transferring apparatus, and the variation of position precision distribution are eliminated, transfer can be attained with superior positi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MORIMOTO KENICHI, SANO NAOTAKE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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