MASK HOLDING MECHANISM

PROBLEM TO BE SOLVED: To provide a mask holding mechanism wherein an error of position precision between a position precision measuring apparatus of a mask and a transferring apparatus, and the variation of position precision distribution are eliminated, transfer can be attained with superior positi...

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Bibliographische Detailangaben
Hauptverfasser:	MORIMOTO KENICHI, SANO NAOTAKE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a mask holding mechanism wherein an error of position precision between a position precision measuring apparatus of a mask and a transferring apparatus, and the variation of position precision distribution are eliminated, transfer can be attained with superior position precision by using an EPL mask, and an LSI pattern or the like of high quality and high precision is formed. SOLUTION: In a transferring technology using electrically-charged particle line, it is characterized by serving both as an object for measuring positional precision, and an object for transfer. It is characterized in that loading is performed to the measuring apparatus of the position precision or the transferring apparatus, or conveying is performed between both of the apparatuses while holding adsorption power to the mask. It is characterized in that the adsorption power to the mask is electrostatic adsorption power. COPYRIGHT: (C)2005,JPO&NCIPI