ANALYZING METHOD USING PROJECTING REGION

ANALYZING METHOD USING PROJECTING REGION

PROBLEM TO BE SOLVED: To carry out a highly precise analysis of an object to be analyzed while suppressing influences of non-analysis section in a substrate, and to enable multiple samples or multiple terms to be simultaneously analyzed by using a simple device structure, when a quantitative analysi...

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Hauptverfasser: SUENAGA TOMOKAZU, UCHIDA ISAMU, SHUKU HITOSHI
Format: Patent
Sprache:eng
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INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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creator SUENAGA TOMOKAZU
UCHIDA ISAMU
SHUKU HITOSHI
description PROBLEM TO BE SOLVED: To carry out a highly precise analysis of an object to be analyzed while suppressing influences of non-analysis section in a substrate, and to enable multiple samples or multiple terms to be simultaneously analyzed by using a simple device structure, when a quantitative analysis or a qualitative analysis of the analyzed object is carried out on an analysis section in the substrate. SOLUTION: In an analyzing method which makes the analyzed object react to a reactant 3 directly or indirectly reacting to the analyzed object on the analysis section A in the substrate 1 and which detects a generated signal originating from this reaction, a signal generation relating section 4x or a detector is disposed at an opposite section opposed to the substrate 1 at least in a signal detection step, and a projecting / recessed section is formed in at least one of the substrate 1 and the opposite section so that the distance between the opposite section and the analysis section A of the substrate 1 is shorter than that between the opposite section and the non-analysis section B of the substrate, thereby detecting signals originating from the reaction in the analysis section A more strongly than signals originating from the reaction in the non-analysis section B. COPYRIGHT: (C)2005,JPO&NCIPI
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2005181350A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2005181350A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2005181350A3</originalsourceid><addsrcrecordid>eNrjZNBw9HP0iYzy9HNX8HUN8fB3UQgNBnECgvy9XJ1DQMwgV3dPfz8eBta0xJziVF4ozc2g5OYa4uyhm1qQH59aXJCYnJqXWhLvFWBkYGBqaGFobGrgaEyUIgBgbiSi</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ANALYZING METHOD USING PROJECTING REGION</title><source>esp@cenet</source><creator>SUENAGA TOMOKAZU ; UCHIDA ISAMU ; SHUKU HITOSHI</creator><creatorcontrib>SUENAGA TOMOKAZU ; UCHIDA ISAMU ; SHUKU HITOSHI</creatorcontrib><description>PROBLEM TO BE SOLVED: To carry out a highly precise analysis of an object to be analyzed while suppressing influences of non-analysis section in a substrate, and to enable multiple samples or multiple terms to be simultaneously analyzed by using a simple device structure, when a quantitative analysis or a qualitative analysis of the analyzed object is carried out on an analysis section in the substrate. SOLUTION: In an analyzing method which makes the analyzed object react to a reactant 3 directly or indirectly reacting to the analyzed object on the analysis section A in the substrate 1 and which detects a generated signal originating from this reaction, a signal generation relating section 4x or a detector is disposed at an opposite section opposed to the substrate 1 at least in a signal detection step, and a projecting / recessed section is formed in at least one of the substrate 1 and the opposite section so that the distance between the opposite section and the analysis section A of the substrate 1 is shorter than that between the opposite section and the non-analysis section B of the substrate, thereby detecting signals originating from the reaction in the analysis section A more strongly than signals originating from the reaction in the non-analysis section B. COPYRIGHT: (C)2005,JPO&amp;NCIPI</description><edition>7</edition><language>eng</language><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; PHYSICS ; TESTING</subject><creationdate>2005</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20050707&amp;DB=EPODOC&amp;CC=JP&amp;NR=2005181350A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20050707&amp;DB=EPODOC&amp;CC=JP&amp;NR=2005181350A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SUENAGA TOMOKAZU</creatorcontrib><creatorcontrib>UCHIDA ISAMU</creatorcontrib><creatorcontrib>SHUKU HITOSHI</creatorcontrib><title>ANALYZING METHOD USING PROJECTING REGION</title><description>PROBLEM TO BE SOLVED: To carry out a highly precise analysis of an object to be analyzed while suppressing influences of non-analysis section in a substrate, and to enable multiple samples or multiple terms to be simultaneously analyzed by using a simple device structure, when a quantitative analysis or a qualitative analysis of the analyzed object is carried out on an analysis section in the substrate. SOLUTION: In an analyzing method which makes the analyzed object react to a reactant 3 directly or indirectly reacting to the analyzed object on the analysis section A in the substrate 1 and which detects a generated signal originating from this reaction, a signal generation relating section 4x or a detector is disposed at an opposite section opposed to the substrate 1 at least in a signal detection step, and a projecting / recessed section is formed in at least one of the substrate 1 and the opposite section so that the distance between the opposite section and the analysis section A of the substrate 1 is shorter than that between the opposite section and the non-analysis section B of the substrate, thereby detecting signals originating from the reaction in the analysis section A more strongly than signals originating from the reaction in the non-analysis section B. COPYRIGHT: (C)2005,JPO&amp;NCIPI</description><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2005</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNBw9HP0iYzy9HNX8HUN8fB3UQgNBnECgvy9XJ1DQMwgV3dPfz8eBta0xJziVF4ozc2g5OYa4uyhm1qQH59aXJCYnJqXWhLvFWBkYGBqaGFobGrgaEyUIgBgbiSi</recordid><startdate>20050707</startdate><enddate>20050707</enddate><creator>SUENAGA TOMOKAZU</creator><creator>UCHIDA ISAMU</creator><creator>SHUKU HITOSHI</creator><scope>EVB</scope></search><sort><creationdate>20050707</creationdate><title>ANALYZING METHOD USING PROJECTING REGION</title><author>SUENAGA TOMOKAZU ; UCHIDA ISAMU ; SHUKU HITOSHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2005181350A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2005</creationdate><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>SUENAGA TOMOKAZU</creatorcontrib><creatorcontrib>UCHIDA ISAMU</creatorcontrib><creatorcontrib>SHUKU HITOSHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SUENAGA TOMOKAZU</au><au>UCHIDA ISAMU</au><au>SHUKU HITOSHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ANALYZING METHOD USING PROJECTING REGION</title><date>2005-07-07</date><risdate>2005</risdate><abstract>PROBLEM TO BE SOLVED: To carry out a highly precise analysis of an object to be analyzed while suppressing influences of non-analysis section in a substrate, and to enable multiple samples or multiple terms to be simultaneously analyzed by using a simple device structure, when a quantitative analysis or a qualitative analysis of the analyzed object is carried out on an analysis section in the substrate. SOLUTION: In an analyzing method which makes the analyzed object react to a reactant 3 directly or indirectly reacting to the analyzed object on the analysis section A in the substrate 1 and which detects a generated signal originating from this reaction, a signal generation relating section 4x or a detector is disposed at an opposite section opposed to the substrate 1 at least in a signal detection step, and a projecting / recessed section is formed in at least one of the substrate 1 and the opposite section so that the distance between the opposite section and the analysis section A of the substrate 1 is shorter than that between the opposite section and the non-analysis section B of the substrate, thereby detecting signals originating from the reaction in the analysis section A more strongly than signals originating from the reaction in the non-analysis section B. COPYRIGHT: (C)2005,JPO&amp;NCIPI</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
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subjects INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
title ANALYZING METHOD USING PROJECTING REGION
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-14T06%3A17%3A15IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SUENAGA%20TOMOKAZU&rft.date=2005-07-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2005181350A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true