LITHOGRAPHIC APPARATUS, METHOD OF DETERMINING MODEL PARAMETER, METHOD OF MANUFACTURING DEVICE, AND DEVICE MANUFACTURED THEREBY

PROBLEM TO BE SOLVED: To provide a method of determining a position of an object and a lithographic projection apparatus. SOLUTION: A method according to an embodiment of the present invention relates to determining at least one parameter of a model providing information on a position of an object....

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Bibliographische Detailangaben
Hauptverfasser: SCHETS SICCO IAN, HUIJBREGTSE JEROEN, VAN DER SCHAAR MAURITS, SWINNEN BART L
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method of determining a position of an object and a lithographic projection apparatus. SOLUTION: A method according to an embodiment of the present invention relates to determining at least one parameter of a model providing information on a position of an object. The object has a plurality of alignment marks clarifying a determined position. The method includes determining a plurality of positional parameters of each alignment mark. The positional parameters are weighted by a weighting factor and measured, and based on the plurality of positional parameters thus obtained, at least one parameter of the model of the object is determined. A numeric value of each weighting factor is determined with at least one parameter of the model. COPYRIGHT: (C)2005,JPO&NCIPI