LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide reference frame materials which reduce production costs without encountering performance problems. SOLUTION: A lithographic apparatus comprises a substrate table WT for holding a substrate W, a projection system PL for projecting a patterned beam onto a target portio...

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Hauptverfasser:	MIGCHELBRINK FERDY, BARTRAY PERTRUS R, LUTTIKHUIS BERNARDUS ANTONIUS JOHANNES, KUIT JAN JAAP, BOX WILHELMUS J, LUIJTEN CARLO CORNELIS MARIA, TEN BHOMER MICHAEL
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide reference frame materials which reduce production costs without encountering performance problems. SOLUTION: A lithographic apparatus comprises a substrate table WT for holding a substrate W, a projection system PL for projecting a patterned beam onto a target portion of the substrate W, and an isolated reference frame MF for providing a reference surface with respect to which the substrate W is measured. The reference frame MF comprises a material having a high coefficient of thermal expansion, and has a sandwich structure or a laminated structure when made of specified materials. COPYRIGHT: (C)2005,JPO&NCIPI