FILM AND FILM STRUCTURE

PROBLEM TO BE SOLVED: To provide a film that can keep a specified space clean, and a film structure provided with the same. SOLUTION: A film 50 wherein a specified space is isolated from an outside air is provided with a first thin film 58 made of an elastic first material, a second thin film 55 mad...

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Bibliographische Detailangaben
Hauptverfasser:	MOTOISHI YASUO, YAMASHITA OSAMU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a film that can keep a specified space clean, and a film structure provided with the same. SOLUTION: A film 50 wherein a specified space is isolated from an outside air is provided with a first thin film 58 made of an elastic first material, a second thin film 55 made of a second material that blocks the entry of the outside air into the specified space, and a metallic film 56 provided between the first thin film 58 and the second thin film 55. COPYRIGHT: (C)2005,JPO&NCIPI