STEP DIFFERENCE MEASURING METHOD, STEP DIFFERENCE MEASURING INSTRUMENT, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To provide a step difference measuring instrument and a step difference measuring method for measuring a step difference easily and precisely, as to a substrate patterned with a light transmitting mask. SOLUTION: The substrate 2 patterned with the light transmitting mask 2a is...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	FUJINO NAOHIKO, KINUGAWA MASARU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS SEMICONDUCTOR DEVICES TESTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a step difference measuring instrument and a step difference measuring method for measuring a step difference easily and precisely, as to a substrate patterned with a light transmitting mask. SOLUTION: The substrate 2 patterned with the light transmitting mask 2a is immersed into a liquid having a refractive index same to that of the mask 2a, light 50 is emitted toward a side patterned with the mask 2a on the substrate 2, reflected light 52 from the substrate 2 is detected to calculate the step difference in the side patterned with the mask 2a on the substrate 2, based on the detected reflected light 52. COPYRIGHT: (C)2005,JPO&NCIPI