OPTICAL ELEMENT, AND IMMERSION TYPE PROJECTION ALIGNER

PROBLEM TO BE SOLVED: To provide a protective film having high liquid resistance and high laser resistance whereby an optical element can be protected from liquid, in an aligner whereto an immersion method is applied. SOLUTION: In an optical element 13 wherein the protective film 12 is formed on the...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	MURAKAMI ATSUNOBU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a protective film having high liquid resistance and high laser resistance whereby an optical element can be protected from liquid, in an aligner whereto an immersion method is applied. SOLUTION: In an optical element 13 wherein the protective film 12 is formed on the surface of an optical substrate 11, the difference between each protruding portion and each recessed portion of irregular shapes is so reduced by applying uniformly constant pressure to the surface of the protective film 12 during a predetermined time, and by polishing the protruding portions of the irregular shapes of its surface as to flatten the surface of the optical element. COPYRIGHT: (C)2005,JPO&NCIPI