ALIGNER

PROBLEM TO BE SOLVED: To provide an aligner which is capable of carrying out an exposure process with high accuracy at all times when a substrate as an object of exposure or a photomask varies in size each time exposure is performed. SOLUTION: The photomask where a mask pattern is formed is provided...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	FUKAZAWA TOSHIO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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