ALIGNER

PROBLEM TO BE SOLVED: To provide an aligner which is capable of carrying out an exposure process with high accuracy at all times when a substrate as an object of exposure or a photomask varies in size each time exposure is performed. SOLUTION: The photomask where a mask pattern is formed is provided...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	FUKAZAWA TOSHIO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an aligner which is capable of carrying out an exposure process with high accuracy at all times when a substrate as an object of exposure or a photomask varies in size each time exposure is performed. SOLUTION: The photomask where a mask pattern is formed is provided as it is kept separate from the substrate as an object of exposure by a certain space. A rectangular collimating mirror 16 is installed over the photomask. A projector is provided so as to irradiate a concave mirror through the intermediary of an integrator with light emitted from a light source to turn it to parallel light, and to irradiate the collimating mirror 16 with the parallel light. A displacement means 26, which displaces the side of the collimating mirror 16 in the directions that intersect the plane of the mirror 16 making the center of the side serve as a support, is provided to each side of the collimating mirror 16. COPYRIGHT: (C)2005,JPO&NCIPI