METHOD AND DEVICE FOR INSPECTING FLAW OF PATTERN SUBSTRATE AND MANUFACTURING METHOD FOR PATTERN SUBSTRATE

PROBLEM TO BE SOLVED: To provide a flaw inspection device capable of inspecting a flaw accurately, and to provide a flaw inspection method using it and a manufacturing method for a pattern substrate. SOLUTION: This flaw inspection device is constituted so as to inspect the flaw of a substrate 11 having the same pattern repeatedly formed thereto and equipped with a light source 13 for emitting light, a detector 15 for outputting the signal based on the intensity of detected light, a delay signal forming part for forming O-N order delay signals by delaying a signal detected corresponding to scanning by O-N (N: an integer of 2 or above) patterns, a difference signal forming part for forming (N) difference signals by setting one of the O-N order delay signals as a reference signal, a comparing part for comparing each of the difference signals with the threshold value and a flaw judging part for judging a flaw based on the number of the difference signals among (N) difference signals. COPYRIGHT: (C)2005,JPO&NCIPI