EXTREME ULTRA VIOLET SOURCE

PROBLEM TO BE SOLVED: To provide a new extreme ultra violet (EUV) radiation source and a photolithography apparatus which increase intensity of EUV radiation. SOLUTION: An EUV radiation source according to the present invention comprises an irradiation chamber 1 including irradiation zone 3. In the irradiation zone 3, a flow of radiation product, such as a flow of xenon propagating along the direction II-II extending to cross an optical axis I-I, is formed. The irradiation zone 3 is arranged at optical axis I-I to be close to barrier wall 4 for connecting an irradiation chamber 1 to a transfer chamber 2. Power laser beams 5 and 6 hit the flow of radiation product in the irradiation zone 3 to produce EUV radiation. The EUV radiation propagates through barrier rib 4 and is adjusted by ellipse mirror 13 in transfer chamber 2. An operation pump 11 maintains pressure P2 in a transfer chamber 2 fully lower than pressure P1 in the irradiation chamber 1. COPYRIGHT: (C)2005,JPO&NCIPI