CVD FILM-FORMING APPARATUS, AND METHOD FOR MANUFACTURING PLASTIC CONTAINER COATED WITH CVD FILM

PROBLEM TO BE SOLVED: To provide a CVD film-forming apparatus which can form a film by using self-bias voltage without being restricted by a shape of a plastic container, and prevents dust from depositing on an electrode. SOLUTION: The CVD film-forming apparatus comprises a space for accommodating a...

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Hauptverfasser: KOBAYASHI TAKUMI, SHIROKURA AKIRA, TAKEMOTO YOSHIHIDE, KAGE TAKESHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a CVD film-forming apparatus which can form a film by using self-bias voltage without being restricted by a shape of a plastic container, and prevents dust from depositing on an electrode. SOLUTION: The CVD film-forming apparatus comprises a space for accommodating a container; a container side electrode that works also as a vacuum chamber, which can accommodate the container in the space so as not to mix a gas inside the container and a gas outside the container; an opening side electrode arranged above an opening of the container in an insulated state from the container side electrode; an inner-gas introduction pipe which is installed so as to be freely inserted/extracted into/from the container, introduces an inner gas of the container such as a source gas into the inner part of the container, and is made of an insulation material; a means for supplying an inner gas of the container; an outer-gas supply means for supplying an outer gas such as a source gas outside the container to the outer part of the container in the space; an exhaust means for exhausting the inner gas of the container; a high-frequency power supply means for supplying a high-frequency power to the container side electrode. COPYRIGHT: (C)2005,JPO&NCIPI