CORROSION RESISTANT MEMBER AND MANUFACTURING METHOD THEREFOR

PROBLEM TO BE SOLVED: To solve a problem that a corrosion resistant member having a corrosion resistant film formed on a substrate, which is used in a portion exposed to a halogen-based corrosive gas such as a fluorine-based gas and a chrorine-based gas, or plasma thereof, increases the surface area...

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Bibliographische Detailangaben
Hauptverfasser: NAKAHARA MASAHIRO, HAYAZAKI TETSUJI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To solve a problem that a corrosion resistant member having a corrosion resistant film formed on a substrate, which is used in a portion exposed to a halogen-based corrosive gas such as a fluorine-based gas and a chrorine-based gas, or plasma thereof, increases the surface area at a portion contacting with the corrosive gases or the plasmas thereof, because a reaction product between components of a substrate and the anti-corrosion film exists on the surface of the corrosion resistant film, or decreases corrosion resistance because the reaction product has a low melting point and vaporizes. SOLUTION: The corrosion resistant member has the corrosion resistant film formed on the surface of the substrate made of ceramic, quartz or Si. The corrosion resistant film has the surface in which a ratio of a maximum peak intensity of crystals in the reaction products of the substrate component with the element Y in the corrosion resistant film made of Y2O3to the maximum peak intensity of the Y2O3crystal is 0.1 or less, when measured by X-ray diffraction. The corrosion resistant member is used for components of an inner wall material (a chamber), a microwave introduction aperture, a shower head, a focus ring and a shield ring of an apparatus for manufacturing a semiconductor or a liquid crystal. COPYRIGHT: (C)2005,JPO&NCIPI