MANUFACTURING METHOD FOR ANISOTROPIC FILM

PROBLEM TO BE SOLVED: To provide a manufacturing method for anisotropic film which neither requires a light irradiation device with a special mechanism nor requires advanced adjustment for alignment. SOLUTION: Photoreactive substance film 3 formed on a deflection element 2 is prepared, and is irradi...

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Bibliographische Detailangaben
1. Verfasser:	SHUDO SHUNSUKE
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a manufacturing method for anisotropic film which neither requires a light irradiation device with a special mechanism nor requires advanced adjustment for alignment. SOLUTION: Photoreactive substance film 3 formed on a deflection element 2 is prepared, and is irradiated with light through the deflection element 2, whereby anisotropy is imparted to the film 3, and then the film 3 is made the anisotropic film. COPYRIGHT: (C)2005,JPO&NCIPI