PHOTOSENSITIVE ELEMENT, DIELECTRIC PATTERN, AND METHOD FOR PRODUCING THE DIELECTRIC PATTERN

PROBLEM TO BE SOLVED: To provide a photosensitive element having superior adhesion to a substrate and capable of forming a dielectric layer of a high-precision uniform pattern shape at a high yield rate. SOLUTION: The photosensitive element has on a support film a photosensitive resin composition la...

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Hauptverfasser:	YAMAZAKI HIROSHI, OHARA MASAHARU, YAMADA NAOKI, TANAKA HIROYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photosensitive element having superior adhesion to a substrate and capable of forming a dielectric layer of a high-precision uniform pattern shape at a high yield rate. SOLUTION: The photosensitive element has on a support film a photosensitive resin composition layer containing (a) dielectric glass frit, (b) an alkali-soluble resin, (c) a photopolymerizable unsaturated monomer and (d) a photopolymerization initiator, wherein an ethylenically unsaturated monomer having a molecular weight of 100-3,000 and having three or more ethylenically unsaturated groups and one or more hydroxyl groups is contained as the photopolymerizable unsaturated monomer (c), in an amount ≥50 mass%, based on the total mass of the photopolymerizable unsaturated monomer. COPYRIGHT: (C)2005,JPO&NCIPI